There are many considerations related to how a part is connected to a test station, and the test...

Sciemetric releases Sciemetric Studio SE


Manufacturing analytics to enable analysis of machine vision data and database access

May 9, 2017Ottawa, Canada – Sciemetric Instruments Inc. (www.sciemetric.com) a pioneer of Industry 4.0 smart technologies used by many global manufacturers to increase yield, improve quality and optimize manufacturing processes, has released a new addition to its family of manufacturing analytics software — Sciemetric Studio SE.

The Sciemetric Studio suite enables manufacturers to easily visualize, review, report on, compare and analyze part data to improve quality and yield on the production line.

Sciemetric’s first Studio release was LT. This low-cost solution gives manufacturing engineers a simple tool to review and compare complex part data for small groups of production and test stations and find the quick path from analysis to answer.

Studio SE expands on LT with additional features and capabilities that optimize station performance with data-driven intelligence:

  • Visualize all types of data including waveforms and images from machine vision systems
  • Connect to a QualityWorX database to access any data from across the production line
  • Work with the latest enhancements to the intuitive ribbon-based interface that make it easier to visualize and interact with data
  • Create an Advanced Trend report by selecting up to 10 features (scalar attributes of a part) that can be viewed to compare their data, either by overlaying on the same graph or arranging as stacked graphs 

“Manufacturers have access to massive amounts of data, but what they need is insight so they can make changes that will improve first-time yield and production efficiency,” said Kevin Houston, Chief Software Architect, Sciemetric. “Studio SE is the tool to help them do that. With SE, manufacturers can act on information from across the production line to set limits, optimize a station, and trace the cause and origin of a problem.”

Download the Sciemetric Studio datasheet >